What material is photoresist


What material is photoresist
Photoresist is one of the key materials for micro pattern processing in microelectronics technology, especially in recent years, the development of large-scale and ultra large scale integrated circuits has greatly promoted the research, development, and application of photoresists. The printing industry is another important field for the application of photoresists.
1. The technology of photoresist is complex and there are many varieties. According to its chemical reaction mechanism and development principle, it can be divided into two categories: negative glue and positive glue. Negative glue forms insoluble substances after exposure to light. On the contrary, for certain solvents that are insoluble and turn into soluble substances after exposure to light, it is called a positive adhesive.
2. During the imaging process of ordinary photoresist, due to the presence of certain diffraction, reflection, and scattering, the contrast of the photoresist pattern is reduced, thereby reducing the resolution of the pattern. As the size of exposure processing features decreases, the impact of reflection and scattering of incident light on improving pattern resolution is also increasing. In order to improve the resolution performance of the exposure system, people are studying a new photoresist technology that covers the surface of the exposed photoresist with an anti reflective coating. The introduction of this technology can significantly reduce the reflection and scattering of incident light on the surface of the photoresist, thereby improving the resolution performance of the photoresist. However, this will result in increased process complexity and lithography costs.