08
2023
-
05
What is the classification of photoresists
Author:
1. Photopolymerization type
Using olefinic monomers, free radicals are generated under the action of light, which further initiate monomer polymerization and ultimately generate polymers, with the characteristic of forming positive images.
2. Photodecomposition type
Using materials containing azide quinone compounds, after exposure to light, a photodegradation reaction occurs, changing from oil soluble to water soluble, and can be made into a positive adhesive.
3. Photocrosslinking type
Polyvinyl alcohol laurate and other photosensitive materials are used. Under the action of light, the double bonds in its molecules are opened, and the chains are crosslinked to form an insoluble network structure, which plays a role in corrosion resistance. This is a typical negative photoresist. Kodak's product KPR adhesive belongs to this category.
Abroad:Manager Chen 18061275662 dom@werlchem.com.
International I:Mavis +86 13320292971 sales@werlchem.com.
International II:Wendy +86 18061276796 intl@werlchem.com.
Address: No. 15, Fortune Avenue, North New District, Chongqing.
Landline:023-67521957.
Scan to follow WeChat official account
Copyright © 2024 Chongqing Werlchem New Materials Technology Co., Ltd